Open AccessEffect of sputtering power on the microstructure of Mg doped ZnO thin films
Author(s) -
Zhen Cheng,
Yuan Meng,
Bianlian Zhang
Publication year - 2020
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/892/1/012020
Subject(s) - sputtering , materials science , microstructure , thin film , refractive index , sputter deposition , doping , ellipsometry , grain size , composite material , optics , optoelectronics , mineralogy , nanotechnology , chemistry , physics
In this paper, Mg doped ZnO thin films were prepared on glass substrates by RF magnetron sputtering. The surface morphology, composition, structure, thickness and refractive index of the films were studied by SEM, XRD and ellipsometer. The results show that the sputtering power has no great influence on the growth direction of the film. When the sputtering power changes from 40 W to 100 W, the crystalline state of the film becomes better, the grain size and the thickness and the refractive index of the film increase with the rising of the sputtering power.