Open AccessA Study of Plasma parameters in gold sputtering System by Means of Optical Emission Spectroscopy
Author(s) -
Sabah N. Mazhir,
Sarah K. Taha,
Noha H. Harb,
Mohammed K. Khalaf
Publication year - 2020
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/871/1/012081
Subject(s) - electron density , electron temperature , sputtering , plasma , emission spectrum , atomic physics , spectroscopy , sputter deposition , emission intensity , electron , intensity (physics) , plasma parameters , materials science , chemistry , analytical chemistry (journal) , spectral line , luminescence , optics , thin film , physics , optoelectronics , nanotechnology , chromatography , quantum mechanics , astronomy
This paper aims at shedding light on investigating the effect of varying plasma parameters of the magnetron sputtering system, the optical emission spectroscopy was used to reach the aime of the paper ; i.e. intensity of spectral Ar-I and Ar-Π lines, electron temperature (T e ), electron density (n) with applied (300-700) V, and working pressure (0.5 – 3.5) mbar. The glow discharge plasma was produced by using Ar gas and gold as a sputtering target. The obtained results showed that the relationship between the spectral lines intensity and electron temperature is positive: the increase of them lead to an increase in the applied voltage while density of electron decreases as the applied voltage is increase in the range (350 – 550) V. Moreover, the Ar-I and Ar-Π spectral lines and electron density increased while its electron temperature decreased following the rise of the gas pressure. The increscent in emission intensity and electron density started to enhance or reduce from low pressure to medium and then increased nearly exponentially, while for high pressure no significance change was observed.