Open AccessThe Influence of Hollow Cathode Geometry and N2-H2 Gas Mixture on the 2 MHz RF-DC Plasma Species and Density
Author(s) -
J. M. Windajanti,
Abdurrouf,
Dionysius Joseph Djoko Herry Santjojo,
Mauludi Ariesto Pamungkas
Publication year - 2020
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/833/1/012097
Subject(s) - plasma , cathode , materials science , electron density , analytical chemistry (journal) , ion , atomic physics , nitriding , plasma parameters , electron temperature , electron , chemistry , layer (electronics) , nanotechnology , physics , organic chemistry , chromatography , quantum mechanics
RF-DC plasma combined with the hollow cathode effect is used to generate plasma inside a hollow cavity. A high-density plasma was formed inside a vacuum chamber using a 2 MHz RF generator. A hollow cathode was utilized to focus the power at the voltage of 150 V with DC bias of -500 V. The plasma system was specially designed for titanium nitriding process at low temperature using N 2 -H 2 gas mixture. The N 2 -H 2 gas with a flow rate of 90-10 mL/minute was conducted at pressure 20 to 150 Pa. The cylindrical and rectangular hollow cathodes are used to make the discharge containing attractive atoms or molecules inside the hollow cavity. The trapped electrons could trigger the secondary electron emission that induced high-density plasma. The geometry components such as gap size, diameter, and cavity depth combined with variations of chamber pressure have been studied to produce high-density plasma. The species inside of N 2 -H 2 plasma were detected by OES based on light emission. The high-intensity peaks of N 2 * molecules from the second positive system and N 2 + ions from the first negative system at the wavelength range of 300 to 500 nm were detected to obtain effective plasma species for the nitriding process.