Open AccessUltrathin film deposition for nanoelectronic device manucturing
Author(s) -
Yu. V. Panfilov,
Ilya A. Rodionov,
Ilya A. Ryzhikov,
Aleksandr S. Baburin,
Dmitriy O. Moskalev,
Evgeniy S. Lotkov
Publication year - 2020
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/781/1/012021
Subject(s) - homogeneity (statistics) , electron beam physical vapor deposition , deposition (geology) , thin film , materials science , vacuum deposition , surface finish , surface roughness , optoelectronics , nanotechnology , optics , composite material , computer science , physics , geology , paleontology , machine learning , sediment
Study results of thin film with thickness less than 50 nm deposition by means of electron beam evaporation on special vacuum coaters were represented. Calculation results of energy and mass carry magnitude for ITO, Ag and Al thin films deposition with preset of structure and composition homogeneity and roughness were shown.