Open AccessInvestigation of MoS2ultrathin films formed by physical vapor deposition in vacuum
Author(s) -
A I Belikov,
Kyaw Zin Phyo,
A. I. Syomochkin
Publication year - 2020
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/781/1/012020
Subject(s) - molybdenum disulfide , materials science , substrate (aquarium) , sputter deposition , thin film , vapour deposition , physical vapor deposition , deposition (geology) , molybdenum , vacuum deposition , optoelectronics , sputtering , cavity magnetron , band gap , chemical vapor deposition , chemical engineering , nanotechnology , metallurgy , paleontology , oceanography , sediment , engineering , biology , geology
The article presents the optical spectroscopy results of molybdenum disulfide ultrathin films deposited on Si substrates by the methods of direct current (DCMS) and pulsed (PMS) magnetron sputtering MoS 2 target in vacuum, and also at flow deposition under the influence of external magnetic field on the substrate. Furthermore, the article revues the results of optical bandgap calculation for all samples of MoS 2 thin films.