Open AccessStudy The Structural Properties of Nanostructure (TiO2: Cu) Thin Film Prepared By RF Magnetron Sputtering
Author(s) -
Khalowd D. Khemkheem,
Najwa J. Jubier,
Abdul Hussain Kh. Elttayef
Publication year - 2020
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/757/1/012055
Subject(s) - materials science , sputter deposition , orthorhombic crystal system , brookite , crystallite , thin film , substrate (aquarium) , sputtering , high power impulse magnetron sputtering , grain size , surface roughness , nanostructure , analytical chemistry (journal) , nanotechnology , crystal structure , crystallography , metallurgy , anatase , composite material , photocatalysis , chemistry , biochemistry , oceanography , chromatography , geology , catalysis
In this research, TiO 2 : Cu thin films deposited on a glass substrate with different thicknesses (100 ) and (200 ) nm by the radio frequency (R.F.) magnetron sputtering process using target TiO 2 : Cu. The sputtering deposition was performed by using the power of 100 Watt. Crystalline structure, surface morphology, and electronic structure were studied using X - ray difraction(XRD).XRD patterns demonstrate that TiO 2 films deposited on a glass substrate at 500 C° are observed to be brookite (orthorhombic) polycrystalline phase with preferred orientation along (111). The average surface roughness (Ra) measured with atomic force microscopy (AFM) was 0.532 nm, and the minimum grain size was 40.5 nm for TiO 2 doped 5%Cu.