Open AccessFrictional behaviour of TiN coatings grown by atomic layer deposition
Author(s) -
Wojciech Grodzicki,
Łukasz Kołodziejczyk
Publication year - 2020
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/743/1/012051
Subject(s) - tin , titanium nitride , materials science , deposition (geology) , layer (electronics) , sputter deposition , sputtering , metallurgy , atomic layer deposition , atomic force microscopy , vapour deposition , titanium , nitride , composite material , coating , thin film , nanotechnology , geology , paleontology , sediment
The main idea of the presented work is the evaluation of frictional properties of the TiN coatings deposited by atomic layer deposition technology using atomic force microscopy approach. Ogletree method was employed in order to calibrate the lateral force and estimate the average friction coefficient of TiN coatings. Obtained titanium nitride coatings were also characterized in terms of morphology, surface topography and mechanical properties. The evaluation has been done with reference to the commercially available TiN produced by commonly known magnetron sputtering method.