Open AccessCalibration method of curvature distortion in step height measurement by atomic force microscopy
Author(s) -
Wei Li,
Xixi Yu,
Sitian Gao,
Yushu Shi,
Shi Li,
Lu Huang,
Shu Zhang
Publication year - 2020
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/715/1/012056
Subject(s) - curvature , distortion (music) , calibration , metrology , scanner , atomic force microscopy , resolution (logic) , materials science , optics , scanning probe microscopy , physics , nanotechnology , geometry , mathematics , computer science , optoelectronics , artificial intelligence , amplifier , cmos , quantum mechanics
Atomic force microscopy (AFM) is widely used to characterize the surface topography in nanomaterials and biology research since the high resolution in 3 dimensions. Height measurement is important in the investigation of graphene thickness. Due to some AFMs use tube scanner, the curved scanning distortion will cause height measurement error. Step height standards calibrated by metrological AFM are used to calibrate the Z axis of conventional AFMs. However, for step structure with large width, the method specified in ISO 5436 is not suitable. The distortion of the curvature scanning is discussed for different samples, and for large step width the influence is significant. So the substrate correction method is proposed to eliminate the scanning curvature and the comparison with several other fitting correction methods is also discussed.