Open AccessDamage characteristics of VO2 films under nanosecond/picosecond laser
Author(s) -
Yuan Lü,
Yue Feng,
Lei Lei Chen,
Chang Wu
Publication year - 2020
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/711/1/012099
Subject(s) - materials science , nanosecond , laser , picosecond , thin film , femtosecond , optics , optoelectronics , ionization , sputtering , nanotechnology , ion , chemistry , physics , organic chemistry
Vanadium dioxide films were prepared by magnetron sputtering method. An experimental apparatus for laser damaging VO 2 thin film was set up. Nanosecond laser and picosecond lasers were used to irradiate the thin film. The damage morphology of the thin film under these two kinds of laser was observed by metallographic microscope. Under the action of nanosecond laser, the damage of thin film is mainly thermal damage, which is mainly determined by the energy contained in the laser pulse itself, and the required damage threshold is relatively higher. The zero probability damage threshold of monopulse irradiate the film is about 0.13J/cm 2 .Under femtosecond laser, the damage of thin film is caused by multi-photon ionization and avalanche ionization, and the damage threshold is relatively lower. The zero probability damage threshold of monopulse irradiate the film is about 10.2m J/cm 2 .