Open AccessA review of iron nitride based thin films development
Author(s) -
Nur Izzati Muhammad Nadzri,
Dayang Mas Shufina Ibrahim,
Saphuang Sompon
Publication year - 2019
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/701/1/012047
Subject(s) - thin film , materials science , iron nitride , nitride , magnetization , semiconductor , stoichiometry , nanotechnology , optoelectronics , magnetic field , chemistry , layer (electronics) , physics , organic chemistry , quantum mechanics
Thin film technology has taken a lot of area in the industry due to their properties which is better than their parents bulk materials. One of the interesting thin films that has yet to be fully explored is iron nitride based thin films has been attracting attention for the past few years especially in the semiconductor technology. Crystal structure and magnetic properties on the film which depend greatly on the growth method, deposition technique, gas flow, pressure and many more. Suitable parameters allow the presence of required iron nitride based thin films stoichiometry. In semiconductor application, magnetization properties play an important role of developing iron nitride thin films. This will give rise to the formation of strong magnetic moment thus increasing the corrosion resistance of the thin film. However, the difficulties of growing a pure phase of these iron nitrides thin films makes it more interesting to study and recent researches have shown findings that open the possibilities in enhancing properties of this iron nitride based thin films.