Open AccessSecondary electron emissive thin film fabricated by atomic layer deposition
Author(s) -
Yanjian Lin,
Y. T. Gu,
Baojun Yan,
Shulin Liu,
Kejun Wen,
Yuman Wang,
Yuekun Heng
Publication year - 2019
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/612/3/032103
Subject(s) - x ray photoelectron spectroscopy , atomic layer deposition , materials science , secondary electrons , layer (electronics) , thin film , ellipsometry , deposition (geology) , electron , analytical chemistry (journal) , electron diffraction , energy dispersive x ray spectroscopy , electron beam induced deposition , scanning electron microscope , cathode ray , secondary emission , electron spectroscopy , diffraction , chemistry , optics , nanotechnology , scanning transmission electron microscopy , nuclear magnetic resonance , composite material , physics , paleontology , quantum mechanics , chromatography , sediment , biology
The secondary electron emissive alumina thin film was fabricated by atomic layer deposition (ALD). The film thickness, structure and composition were characterized by Spectroscopic Ellipsometry (SE), X-ray Diffraction (XRD) and X-ray photoelectron spectroscopy (XPS), respectively. The secondary electron yield ( σ ) of the sample was measured by pulsed electron beam method and the influences of primary electron energy and primary electron angle on the σ have been investigated.