Open AccessPolycrystalline BiFeO3 thin films prepared by magnetic controlling sputtering method
Author(s) -
X. F. Liu,
W. G. Wang,
Jun Yin,
ChenYabei Wu,
J. X. Chen,
X. J. Wang
Publication year - 2019
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/612/3/032025
Subject(s) - crystallite , materials science , annealing (glass) , sputter deposition , impurity , sputtering , thin film , optoelectronics , analytical chemistry (journal) , metallurgy , nanotechnology , chemistry , organic chemistry , chromatography
Polycrystalline BiFeO 3 films were fabricated by radio frequency magnetron sputtering using a Bi 1.1 FeO 3 target onto the glass and Si/SiO 2 /Ti/Pt substrates respectively. The samples which were annealed with different annealing conditions are pure without impurities. Our results indicate that there are relatively wider growth conditions for pure polycrystalline BFO phases.