Open AccessAblation morphology and redistribution layer of gold films with different substrates irradiated by femtosecond laser pulse
Author(s) -
Zhijie Xu
Publication year - 2019
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/569/2/022027
Subject(s) - materials science , femtosecond , nanostructure , optoelectronics , scanning electron microscope , nanolithography , laser , ablation , irradiation , laser ablation , nanotechnology , fabrication , optics , composite material , medicine , physics , nuclear physics , alternative medicine , engineering , pathology , aerospace engineering
Gold micro/nanostructure is of great significance in many scientific and engineering fields for its unique optical, electrical and thermal properties. Gold film deposited through electron beam (EB) evaporation is a suitable raw material for the fabrication of gold micro/nanostructure. Femtosecond laser directing is one of the reported methods for high-efficiency and low-cost micro/nanofabrication. We present a comparative study of gold film ablation with different substrates (Si, SiO 2 , ZnO) under the irradiation of single femtosecond Gaussian pulse. The morphologies of ablation areas and redistribution layers are investigated by many characterization methods, such as scanning electron microscopy (SEM) and atomic force microscopy (AFM). In general, the ablation morphology and the ablation hole are mainly affected by the bandgap. Besides, the heat conductivity is the main factor affecting the width and height of the redistribution layer.