Open AccessFemtosecond Laser Double Pulses Nanofabrication on Silicon
Author(s) -
Jin Zhang,
Sumei Wang,
Mengmeng Wang,
Zhuyuan Chu
Publication year - 2019
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/565/1/012018
Subject(s) - laser , femtosecond , fluence , materials science , femtosecond pulse shaping , silicon , pulse (music) , optics , x ray laser , optoelectronics , multiphoton intrapulse interference phase scan , ultrashort pulse , laser power scaling , physics , detector
The temporal shaping femtosecond (fs) laser is realized by dividing a fs laser pulse into two identical sub-pulses. The double-pulse fs laser can be used to effectively control the initial free electron state such as electron temperature, capacity and density, etc. to improve the surface morphology quality. In this experiment, silicon was fabricated using the double-pulse fs laser. It was found that the average diameter of ablated micro-or nanoholes decreases with the increasing pulse delay (up to 1.5 ps) under the same laser fluence and the phenomenon was explained quantitatively by the plasma model. Furthermore, nanoholes were achieved using the double-pulse fs laser, which cannot be obtained by single pulse laser, and the processing size can be reduced to below 200 nm.