Open AccessDesign, Modeling and Analysis of a XY Nanopositioning Stage for High Speed Scanning
Author(s) -
Shenglong Lin,
Xianmin Zhang,
Benliang Zhu
Publication year - 2019
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/538/1/012043
Subject(s) - parallelogram , natural frequency , workbench , workspace , bandwidth (computing) , coupling (piping) , stiffness , finite element method , beam (structure) , stage (stratigraphy) , computer science , optics , acoustics , electronic engineering , physics , engineering , mechanical engineering , structural engineering , vibration , telecommunications , paleontology , visualization , hinge , artificial intelligence , robot , biology
In order to increase the imaging speed of scanning probe microscopy (SPM), especially atomic force microscopy (AFM) where needs a high-bandwidth moving stage possessing high resonant frequency and low cross-coupling, the paper proposes a kind of XY nanopositioning stage achieving about 10kHz resonant frequency, 15um×15um workspace and well decoupled performance. Considering the design objective, a compliant nanopositioning stage is built with doubly clamped beam and parallelogram hybrid beam for overcoming the problem of low natural frequency and cross-coupling performance. By establishing mathematical model of the proposed stage including stiffness model and resonant frequencies model, the paper solves the highest natural frequency with its optimal dimensions of beams by applying optimization. Finally the designed stage is imported to Workbench for the validation of mathematical model by simulation, where presents the FEA results can nicely match the analytical results.