Open AccessInvestigation of the surface layer thickness uniformity at the magnetron sputtering depending on the geometry of the flow
Author(s) -
E. O. Nasakina,
M. A. Sudarchikova,
Г. С. Спрыгин,
M. I. Baskakova,
I. M. Fedyuk,
A. Bespamiatnova,
Е. А. Данилова,
S. V. Konushkin,
А. В. Леонов,
M. A. Sevostyanov,
А. Г. Колмаков
Publication year - 2019
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/525/1/012062
Subject(s) - sputtering , materials science , substrate (aquarium) , auger electron spectroscopy , layer (electronics) , sputter deposition , auger , composite number , composite material , geometry , analytical chemistry (journal) , chemistry , thin film , atomic physics , nanotechnology , geology , physics , oceanography , mathematics , chromatography , nuclear physics