Open AccessSimulation of low energy ion implantation in silicon
Author(s) -
Denis Veselov,
Yu. A. Voronov,
Yu. V. Metel
Publication year - 2019
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/498/1/012035
Subject(s) - annealing (glass) , boron , indium , silicon , materials science , ion implantation , oxidizing agent , doping , inert , impurity , wafer , optoelectronics , low energy , ion , nanoscopic scale , analytical chemistry (journal) , nanotechnology , metallurgy , atomic physics , chemistry , physics , organic chemistry , chromatography