Open AccessTemperature influence on process of Ti/Al/Ni/Au contact formation to heterostructure AlGaN/GaN
Author(s) -
S. A. Shostachenko,
Y A Porokhonko,
Р. В. Захарченко,
Sergey Leshchev,
Mikhail M. Maslov,
Konstantin P. Katin
Publication year - 2019
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/498/1/012019
Subject(s) - ohmic contact , materials science , heterojunction , annealing (glass) , contact resistance , optoelectronics , doping , transistor , metallurgy , nanotechnology , electrical engineering , voltage , engineering , layer (electronics)