Open AccessMorphological and Structural Properties of CVD Deposited Titanium Aluminium Nitride (TiAlN) Thin Films
Author(s) -
Santanu Das,
Spandan Guha,
Ranjan Kumar Ghadai,
Dheeraj Kumar,
Bibhu P. Swain
Publication year - 2018
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/377/1/012178
Subject(s) - x ray photoelectron spectroscopy , raman spectroscopy , materials science , thin film , titanium , scanning electron microscope , analytical chemistry (journal) , chemical vapor deposition , nitride , aluminium , chemical engineering , metallurgy , nanotechnology , composite material , chemistry , optics , physics , chromatography , layer (electronics) , engineering
Titanium aluminium nitride (TiAlN) thin film coatings were synthesized via Atmospheric pressure chemical vapour deposition (APCVD) at various deposition temperature using titanium di-oxide (TiO 2 ) powder, Al powder (99% pure) and N 2 gas. The thin films were characterized by scanning electron microscopy (SEM), Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) for analysing the morphological, vibrational and compositional characteristics of the deposited film. SEM images showed successful deposition of TiAlN thin film over Si wafers. Raman peaks revealed the optical phonon bands of the coated thin film within a range of 214.6-335.1 cm -1 and 552.63-815.23 cm -1 for acoustic and optic range respectively at different processing temperatures. XPS spectra clearly showed the presence of different phases like Ti-N, Ti-O-N, Al 2 O 3 , N-Al, TiO 2 Al-O in Ti (2p), Al (2p) and N (1s) orbitals, which is in a good agreement with past work.