Open AccessPhotoresist: Fabrication, Characterization and Its Sensitivity on the Exposures of X-Ray and Ultraviolet
Author(s) -
Sutikno Sutikno,
Susilo Susilo,
H. D. Raharja
Publication year - 2018
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/367/1/012022
Subject(s) - photoresist , materials science , ultraviolet , analytical chemistry (journal) , epoxy , fabrication , wavelength , spin coating , thin film , optoelectronics , chemistry , nanotechnology , composite material , chromatography , medicine , alternative medicine , layer (electronics) , pathology