Open AccessOne-step microwave plasma enhanced chemical vapor deposition (MW-PECVD) for transparent superhydrophobic surface
Author(s) -
Sukrit Thongrom,
Yutthana Tirawanichakul,
Nantakan Munsit,
Chalongrat Deangngam
Publication year - 2018
Publication title -
iop conference series. materials science and engineering
Language(s) - Uncategorized
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/311/1/012015
Subject(s) - plasma enhanced chemical vapor deposition , materials science , coating , contact angle , chemical vapor deposition , plasma , layer (electronics) , fabrication , deposition (geology) , microwave , optoelectronics , inert , nanotechnology , composite material , chemistry , medicine , paleontology , physics , alternative medicine , organic chemistry , pathology , quantum mechanics , sediment , biology