Open AccessEffects of substrate heating and post-deposition annealing on characteristics of thin MOCVD HfO2films
Author(s) -
Sundararaman Gopalan,
Sivaramakrishnan Ramesh,
Shibesh Dutta,
Venkata Virajit Garbhapu
Publication year - 2018
Publication title -
iop conference series materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/310/1/012125
Subject(s) - materials science , annealing (glass) , metalorganic vapour phase epitaxy , thin film , dielectric , optoelectronics , substrate (aquarium) , high κ dielectric , ferroelectric ram , composite material , nanotechnology , ferroelectricity , epitaxy , layer (electronics) , oceanography , geology
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom