Open AccessInfluence of oxygen flow rate on structural, optical and electrical properties of copper oxide thin films prepared by reactive magnetron sputtering
Author(s) -
Thitinai Gaewdang,
Ngamnit Wongcharoen
Publication year - 2017
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/211/1/012025
Subject(s) - van der pauw method , materials science , electrical resistivity and conductivity , thin film , sputter deposition , analytical chemistry (journal) , copper oxide , band gap , sputtering , volumetric flow rate , oxide , oxygen , copper , hall effect , nanotechnology , optoelectronics , metallurgy , chemistry , electrical engineering , physics , engineering , organic chemistry , chromatography , quantum mechanics