Open AccessDeposition of the low resistive ITO-films by means of reactive magnetron sputtering of the In/Sn target on the cold substrate
Author(s) -
Yury Zhidik,
P. E. Troyan,
E V Baturina,
D V Korzhenko,
Y N Yurjev
Publication year - 2016
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/135/1/012055
Subject(s) - sputter deposition , materials science , substrate (aquarium) , deposition (geology) , resistive touchscreen , sputtering , optoelectronics , cavity magnetron , sheet resistance , semiconductor , thin film , nanotechnology , electrical engineering , layer (electronics) , engineering , paleontology , oceanography , sediment , geology , biology
Detailed information on the deposition technology of the low-resistive ITO-films in oxygen-containing media by magnetron reactive sputtering from the In(90%)/Sn(10%) target on the cold substrate is given. Developed technology allows deposition ITO-films with sheet resistance transparency higher than 90%. Developed technology is notable for high reproducibility of results and is compatible with production technology of semiconductor devices of optoelectronics