Open AccessGrowth mechanism of Co:TiO2thin film deposited by metal organic chemical vapor deposition technique
Author(s) -
Aip Saripudin,
Pepen Arifin
Publication year - 2016
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/128/1/012046
Subject(s) - chemical vapor deposition , activation energy , atmospheric temperature range , thin film , metal , materials science , decomposition , metalorganic vapour phase epitaxy , combustion chemical vapor deposition , substrate (aquarium) , diffusion , chemical engineering , inorganic chemistry , silicon , titanium dioxide , chemistry , carbon film , nanotechnology , epitaxy , metallurgy , organic chemistry , physics , oceanography , layer (electronics) , geology , meteorology , engineering , thermodynamics