Open AccessReliability Failure in Microelectronic Interconnects by Electric Current Induced Chemical Reaction
Author(s) -
Swarun Kumar,
Praveen Kumar,
Rudra Pratap
Publication year - 2021
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/1206/1/012026
Subject(s) - microelectronics , cathode , materials science , anode , electric field , electromigration , interconnection , chemical reaction , current density , thin film , current (fluid) , fabrication , optoelectronics , multiphysics , chemical process , nanotechnology , electrical engineering , electrode , composite material , chemistry , computer science , alternative medicine , computer network , pathology , engineering , biochemistry , quantum mechanics , thermodynamics , medicine , physics , finite element method , organic chemistry
The electric field-induced chemical reaction in Cr thin film by a micro/nano-probe has been recently reported with detailed characterization. Although the phenomenon is employed for micro-nano fabrication, this can act as a reliability failure, where Cr is used as an adhesion layer or main interconnects in microelectronic circuits. Here, we present an investigation on the role of electric current density for such failure using a specifically designed sample. A 100 μm width and 100 nm thin Cr film is deposited perpendicular to the Pt film of similar dimensions. The anode probe (20 μm diameter) is positioned onto the Pt film, whereas the cathode probe onto the Cr film. It is observed that the chemical reaction, for an applied voltage, initiates at the edge of the Pt film and not at the cathode probe. The localized chemical reaction causes to damage the interconnection line. The analysis based on the COMSOL multiphysics simulation illustrates that the chemical reaction evolves at the high current density locations. The study also builds a fundamental understanding of the mechanism of evolution of patterning by electric field-induced chemical reactions.