Open AccessStructural, optical and wettability properties of zirconium oxide thin films deposited at various helium partial pressure
Author(s) -
Nicky P. Patel,
Kamlesh V. Chauhan
Publication year - 2021
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/1126/1/012038
Subject(s) - materials science , contact angle , wetting , partial pressure , thin film , surface roughness , zirconium , transmittance , goniometer , oxide , sputter deposition , helium , composite material , analytical chemistry (journal) , ellipsometry , sputtering , optics , metallurgy , nanotechnology , optoelectronics , chemistry , oxygen , organic chemistry , physics
The aim of the present work is to deposit zirconium oxide thin films by reactive magnetron sputtering on glass substrates. The influence of helium partial pressure on structural, optical and wettability properties are investigated. The structural properties were investigated using X-Ray Diffraction, which shows that the films deposited has (111) peak of Zirconium Oxide. The intensity of the peak increased with the increase in helium partial pressure. UV-Vis-NIR spectrophotometer was used to study the optical properties of the films; the deposited films were transparent and had excellent transmittance of 95%. Surface roughness measured was in the range of 20.9nm to 21.8nm, the roughness of the deposited films decreased with increase in helium partial pressure. The wettability property measured using contact angle goniometer had a maximum contact angle of 94.1°, which proves that the deposited film has hydrophobic property when measured using water.