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Effect of thickness and type of substrate on optical properties of chromium oxide thin film prepared by sputtering magnetron
Author(s) -
Mohammed K. Khalaf,
Dawood S. Abed Al-Kader,
Jassim Mohammed salh
Publication year - 2021
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/1105/1/012065
Subject(s) - materials science , thin film , chromium , refractive index , sputter deposition , molar absorptivity , substrate (aquarium) , transmittance , absorbance , crystallization , sputtering , fused quartz , cavity magnetron , oxide , quartz , optics , optoelectronics , composite material , metallurgy , chemical engineering , nanotechnology , oceanography , physics , engineering , geology
The study here submits the impact of the thin-film thickness of chromium on its optical characteristics. All the films of chromium oxide were deposited on quartz and glass substrates via sputtering magnetron. The optical characteristics for a thin film was established out of measurements of transmitting. The spectrum of absorbance and transmittance have been recorded as a function of wavelength between (300-1100 nm) in order to study the Energy gap of permitted direct transition, extinction coefficient and refractive index. The improvement of the crystallization of the coatings / thin film has been discussed depending on substrate which are glass and quartz temperature. Under the experimental conditions; for temperature about (20-150) °C, the films consist of clear well-crystallized (Cr 2 O 3 ).

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