Open AccessAnnealing Effect on Structural and Optical Properties of Cr2O3 Thin Films Prepared by R.F Magnetron Sputtering
Author(s) -
Mohammed K. Khalaf,
Dawood salman abd al-kader,
Jassim Mohammed salh
Publication year - 2021
Publication title -
iop conference series. materials science and engineering
Language(s) - English
Resource type - Journals
eISSN - 1757-899X
pISSN - 1757-8981
DOI - 10.1088/1757-899x/1105/1/012064
Subject(s) - annealing (glass) , materials science , crystallinity , sputter deposition , chromium , thin film , analytical chemistry (journal) , oxide , cavity magnetron , sputtering , absorption edge , metallurgy , optoelectronics , composite material , nanotechnology , band gap , chemistry , chromatography
The films of Chromium oxide were deposited on the glass substrates by sputtering magnetron mothed. After that, every film was under annealing at 500 degrees. The spectra of absorption were utilized in determining the coefficient of absorption of a film and every impact of the temperature for annealing on the coefficient was under investigation. The edge of absorption moved towards the red range of the wavelength and the chromium (III) films’ optical constants decrease after being annealed at 500 degrees. The XRD results show that the annealing time has a profound effect on crystallinity and crystallographic orientation of Cr 2 O 3 thin films. These factors can affect the performance and application of devices. It was uncovered that the content of the adsorbed oxygen declines with raising the annealing temperature, AFM researches of chromium (III) oxide thin films show a surface soft sprinkles after annealing.