Open AccessGis-Based Fire Risk Spatial Assessment for Semiconductor Plant
Author(s) -
Hongga Li,
Xiaoxia Huang
Publication year - 2021
Publication title -
iop conference series. earth and environmental science
Language(s) - English
Resource type - Journals
eISSN - 1755-1307
pISSN - 1755-1315
DOI - 10.1088/1755-1315/772/1/012080
Subject(s) - blueprint , risk assessment , analytic hierarchy process , process (computing) , computer science , geographic information system , risk management , risk analysis (engineering) , engineering , remote sensing , geography , operations research , computer security , business , mechanical engineering , finance , operating system
Traditional fire risk assessment of semiconductor plant mainly relies on engineer experience from fields of fire control, chemistry, construction, semiconductor and insurance, and lacks a collaborative tool to integrate different design blueprints and locate high risk regions. In this paper, we introduce GIS into fire risk research for semiconductor industry, and propose a GIS-based spatial and quantitative method of fire risk assessment. Based on semiconductor plant spatial database extracted from diversified indoor maps, we set up a fire risk index system and integrate factors of potential fire source, operation risks of fabrication process, fire proof design and fire management to identify the high fire risk regions by using analytic hierarchy process. The proposed method improves spatial analysis capabilities of fire risk assessment for more and more complex semiconductor factories.