Open AccessResearch of high-performance DLC Film on Si Substrate by Pulsed Laser Deposition
Author(s) -
Shuyun Wang,
Liang Xu,
Yi Liu,
Weixin Zhang,
Zhuolun Li,
Guo Yan-long
Publication year - 2019
Publication title -
iop conference series. earth and environmental science
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.179
H-Index - 26
eISSN - 1755-1307
pISSN - 1755-1315
DOI - 10.1088/1755-1315/371/4/042014
Subject(s) - pulsed laser deposition , materials science , femtosecond , substrate (aquarium) , deposition (geology) , silicon , chemical vapor deposition , laser , thin film , composite material , optoelectronics , nanotechnology , optics , paleontology , oceanography , physics , biology , sediment , geology
Femtosecond pulsed laser was used to deposit DLC films. Through methods of oxygen ambient and mixing silicon, no-hydrogen DLC films were deposited with more excellent transmission, hardness, adhesion and stability than those by chemical vapor deposition or traditional pulsed laser deposition (PLD). The transmission of 3∼5μm band was larger than or equal to 91.7%, and the hardness up to 40∼50GPa. All the films passed the tests of high temperature, low temperature, salt-fog and heavy-friction tests. The performances of the samples satisfied optical engineering need.