Open AccessMethod of Preparation AZP4330 PR Pattern with Edge Slope 40°
Author(s) -
Jie Wu,
Hang Zhao,
Yuanwei Yu,
J. Jim Zhu
Publication year - 2018
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/986/1/012015
Subject(s) - photoresist , enhanced data rates for gsm evolution , materials science , reliability (semiconductor) , lithography , optoelectronics , optics , geometry , computer science , composite material , layer (electronics) , physics , mathematics , telecommunications , power (physics) , quantum mechanics