Open AccessSupersonic plasma outflow in a plasmochemical method of amorphous silicon thin films formation
Author(s) -
Л. В. Баранова,
В. И. Струнин,
Г. Ж. Худайбергенов
Publication year - 2018
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/944/1/012008
Subject(s) - supersonic speed , materials science , amorphous silicon , silicon , nozzle , plasmatron , amorphous solid , thin film , jet (fluid) , deposition (geology) , plasma , atomic physics , nanotechnology , mechanics , chemistry , optoelectronics , crystalline silicon , physics , thermodynamics , crystallography , paleontology , quantum mechanics , sediment , biology