Open AccessOptimization of process parameters in the RF-DC plasma N2-H2for AISI420moldsanddies
Author(s) -
Hengky Herdianto,
D.J. Djoko,
H. Santjojo,
Masruroh Masruroh
Publication year - 2017
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/909/1/012027
Subject(s) - materials science , substrate (aquarium) , plasma , molding (decorative) , nitriding , nitride , forging , plasma cleaning , nitrogen , fabrication , distribution uniformity , cathode , optoelectronics , analytical chemistry (journal) , composite material , layer (electronics) , metallurgy , chemistry , medicine , oceanography , physics , organic chemistry , alternative medicine , quantum mechanics , pathology , chromatography , geology