Open AccessStudy of interfacial structure of HfO2thin film on Si by grazing incidence x-ray reflectivity
Author(s) -
Lulu Zhang,
S. Terauchi,
Ruiqin Tan,
Yasushi Azuma,
Toshiyuki Fujimoto
Publication year - 2007
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/83/1/012032
Subject(s) - x ray photoelectron spectroscopy , materials science , silicate , x ray reflectivity , annealing (glass) , transmission electron microscopy , thin film , oxygen , substrate (aquarium) , analytical chemistry (journal) , reflectivity , silicon , sputtering , optics , chemical engineering , chemistry , composite material , optoelectronics , nanotechnology , oceanography , physics , organic chemistry , chromatography , geology , engineering