Open AccessThin film zinc oxide deposited by CVD and PVD
Author(s) -
Frank Hamelmann
Publication year - 2016
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/764/1/012001
Subject(s) - materials science , thin film , doping , chemical vapor deposition , zinc , physical vapor deposition , transparent conducting film , oxide , sputtering , conductivity , optoelectronics , chemical engineering , nanotechnology , metallurgy , chemistry , engineering