Open AccessE-beam lithography exposure conditions for the fabrication of RGB filter based on metal/dielectric subwavelength grating
Author(s) -
Sergey A. Fomchenkov,
Muhammad Ali Butt,
В. В. Подлипнов,
Сергей Дмитриевич Полетаев,
Р. В. Скиданов,
Nikolay L. Kazanskiy
Publication year - 2016
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/741/1/012150
Subject(s) - grating , materials science , optics , dielectric , fabrication , lithography , rgb color model , beam (structure) , optoelectronics , electron beam lithography , diffraction grating , resist , nanotechnology , physics , computer science , operating system , medicine , alternative medicine , pathology , layer (electronics)