Open AccessDry e-beam etching of resist for optics
Author(s) -
A. E. Rogozhin,
M.A. Bruk,
E. N. Zhikharev,
D. R. Streltsov,
А. В. Спирин,
J Hramchihina
Publication year - 2016
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/741/1/012115
Subject(s) - resist , optics , lithography , etching (microfabrication) , diffraction , materials science , beam (structure) , planar , dry etching , electron beam lithography , optoelectronics , nanotechnology , physics , computer science , computer graphics (images) , layer (electronics)