Open AccessAn influence of technological parameters of plasma-chemical deposition of SiO2films on their electro-physical properties
Author(s) -
A. A. Romanov,
A V Serkov,
E S Hruleva
Publication year - 2016
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/729/1/012015
Subject(s) - materials science , deposition (geology) , silicon carbide , plasma , silicon , dielectric , engineering physics , chemical engineering , optoelectronics , composite material , engineering , geology , physics , paleontology , quantum mechanics , sediment