Open AccessHybrid plasma system for magnetron deposition of coatings with ion assistance
Author(s) -
К. В. Вавилин,
E.A. Kralkina,
P.A. Nekludova,
A. K. Petrov,
A. M. Nikonov,
В.Б. Павлов,
A. A. Airapetov,
V. V. Odinokov,
G. Ya. Pavlov,
V. A. Sologub
Publication year - 2016
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/669/1/012033
Subject(s) - plasma , cavity magnetron , ion , materials science , sputter deposition , ion current , argon , atomic physics , magnetic field , current density , substrate (aquarium) , plasma parameters , optoelectronics , sputtering , chemistry , physics , thin film , nanotechnology , oceanography , organic chemistry , quantum mechanics , geology