Open AccessMagnetron sputtering system for coatings deposition with activation of working gas mixture by low-energy high-current electron beam
Author(s) -
Н. В. Гаврилов,
A. S. Kamenetskikh,
A. I. Men’shakov,
O A Bureyev
Publication year - 2015
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/652/1/012024
Subject(s) - materials science , sputtering , sputter deposition , ion beam deposition , analytical chemistry (journal) , atomic physics , ionization , coating , plasma , cathode , ion beam , cavity magnetron , deposition (geology) , cathode ray , ion , electron , chemistry , thin film , nanotechnology , paleontology , physics , organic chemistry , chromatography , quantum mechanics , sediment , biology