Open AccessSpectroscopy for identification of plasma sources for lithography and water window imaging
Author(s) -
Gerry O'Sullivan,
Padraig Dunne,
Takeshi Higashiguchi,
Bowen Li,
Ragava Lokasani,
Elaine Long,
Hayato Ohashi,
Fergal O’Reilly,
Paul Sheridan,
John Sheil,
Emma Sokell,
C. Suzuki,
Tao Wu
Publication year - 2015
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/635/9/092037
Subject(s) - extreme ultraviolet lithography , extreme ultraviolet , water window , lithography , plasma , optics , materials science , window (computing) , spectroscopy , plasma diagnostics , laser , optoelectronics , physics , computer science , astronomy , nuclear physics , operating system