Open AccessRare-earth based ultra-thin Lu2O3for high-k dielectrics
Author(s) -
Peter Darmawan,
P.S. Chia,
Pooi See Lee
Publication year - 2007
Publication title -
journal of physics. conference series
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/61/1/046
Subject(s) - materials science , high resolution transmission electron microscopy , annealing (glass) , amorphous solid , thin film , dielectric , pulsed laser deposition , analytical chemistry (journal) , root mean square , high κ dielectric , transmission electron microscopy , equivalent oxide thickness , surface roughness , oxide , optoelectronics , nanotechnology , crystallography , gate oxide , composite material , metallurgy , chemistry , physics , engineering , chromatography , transistor , voltage , quantum mechanics , electrical engineering