Open AccessIncorporation of nitrogen into TiO2thin films during PVD processes
Author(s) -
I. Asenova,
D. Manova,
S. Mändl
Publication year - 2014
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/559/1/012008
Subject(s) - nitrogen , thin film , materials science , chemical engineering , physical vapor deposition , nanotechnology , chemistry , engineering , organic chemistry