Open AccessECWR plasma enhanced chemical vapour deposition of microcrystalline silicon thin films
Author(s) -
E. Farsari,
Angelos G. Kalampounias,
E. Amanatides,
D. Mataras
Publication year - 2014
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/550/1/012031
Subject(s) - microcrystalline silicon , microcrystalline , materials science , chemical vapor deposition , thin film , plasma , plasma enhanced chemical vapor deposition , silicon , deposition (geology) , chemical engineering , nanotechnology , optoelectronics , chemistry , crystalline silicon , crystallography , amorphous silicon , geology , engineering , physics , paleontology , quantum mechanics , sediment