Open AccessSurface morphology of RF plasma immersion H+ ion implanted and oxidized Si(100) surface
Author(s) -
Mihai Anastasescu,
M. Stoica,
M. Gärtner,
S. Bakalova,
A. Szekeres,
S. Alexandrova
Publication year - 2014
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/514/1/012036
Subject(s) - fluence , materials science , ion , wafer , surface roughness , plasma immersion ion implantation , analytical chemistry (journal) , ion implantation , plasma , oxide , hydrogen , silicon , thermal oxidation , surface finish , chemistry , optoelectronics , composite material , metallurgy , physics , organic chemistry , quantum mechanics , chromatography