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Study of magnetic field enhanced plasma immersion ion implantation in Silicon
Author(s) -
E.J.D.M. Pillaca,
K. G. Kostov,
M. Ueda
Publication year - 2014
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/511/1/012084
Subject(s) - plasma immersion ion implantation , immersion (mathematics) , plasma , silicon , materials science , ion , ion implantation , magnetic field , optoelectronics , chemistry , physics , nuclear physics , mathematics , organic chemistry , quantum mechanics , pure mathematics

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