Open AccessHigh-resolution X-ray microdiffraction from a locally strained SOI with a width of 150 nm
Author(s) -
Yoshihiko Imai,
Shigeru Kimura,
Daisuke Kosemura,
Atsushi Ogura
Publication year - 2014
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/502/1/012026
Subject(s) - silicon on insulator , materials science , optoelectronics , x ray , resolution (logic) , optics , physics , computer science , silicon , artificial intelligence