Open AccessSilicon Oxide Thin Films Prepared by Vacuum Evaporation and Sputtering Using Silicon Monoxide
Author(s) -
Misao Sasaki,
Takashi Ehara
Publication year - 2013
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/417/1/012028
Subject(s) - silicon monoxide , materials science , silicon , raman spectroscopy , silicon oxide , sputtering , evaporation , amorphous solid , nanocrystalline silicon , thin film , oxide thin film transistor , oxide , amorphous silicon , vacuum evaporation , analytical chemistry (journal) , monoxide , crystalline silicon , optoelectronics , nanotechnology , optics , chemistry , layer (electronics) , crystallography , metallurgy , silicon nitride , thin film transistor , organic chemistry , physics , thermodynamics