Open AccessThermal conductivity measurement of suspended Si-N membranes from 10 K to 275 K using the 3ω-Völklein method
Author(s) -
Hossein Ftouni,
Christophe Blanc,
A. Sikora,
Jacques Richard,
Martial Defoort,
Kunal Lulla,
Eddy Collin,
Olivier Bourgeois
Publication year - 2012
Publication title -
journal of physics. conference series
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.21
H-Index - 85
eISSN - 1742-6596
pISSN - 1742-6588
DOI - 10.1088/1742-6596/395/1/012109
Subject(s) - thermal conductivity , membrane , analytical chemistry (journal) , materials science , chemistry , chromatography , composite material , biochemistry
International audienceThe thermal properties of suspended thin films prepared by the micro-machining process have been measured using the 3! dynamic method coupled to a Volklein geometry. A transducer (heater/thermometer) centered on the membrane is driven by an ac current causingperiodic thermal oscillations. The measurement of the temperature oscillation on the membrane is made at the third harmonic using a Wheatstone bridge set up. Here by coupling the 3! method to a Voolklein geometry (suspended membrane) we obtained a highly sensitive techniqueto measure the thermal conductance with a resolution of (..K=K = 10-3) and a sensitivity of the order of nanoWatt/K, thanks to a very sensitive niobium nitride thermometry. This method is applied to measure the in-plane thermal conductivity of 100 nm silicon nitride membrane, inthe temperature range of 10-275